Category: Sample Preparation | Subcategory: Coating

Cressington 208HR High Resolution Sputter Coater for FESEM

Cressington  208HR High Resolution Sputter Coater for FESEM Image

ITEM: 28959

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Cressington  208HR High Resolution Sputter Coater for FESEM ImageCressington  208HR High Resolution Sputter Coater for FESEM ImageCressington  208HR High Resolution Sputter Coater for FESEM ImageCressington  208HR High Resolution Sputter Coater for FESEM ImageCressington  208HR High Resolution Sputter Coater for FESEM Image
The Cressington 208HR High Resolution Sputter Coater for FESEM Model 8000-8 provides a full range of coating materials. It gives unprecedented control over thickness and deposition conditions to coating difficult samples for FE-SEM.

Specifications for High Resolution Sputter Coater:
- Sputter target: Cr, Pt/Pd as standard (Ta, Au, Au/Pd, Pt or W optional)
- Analogue metering: Vacuum, Atm - 0.001mb, Current, 0 - 100mA
- Thickness control: MTM-20 with termination facility
- Control method:
Automatic operation of gas purge and leak functions
Automatic process sequencing
Full manual override
Digital timer, 5 - 300 seconds with pause
Automatic vent
- Sputter head:
Low voltage planar magnatron
Quick target change
Wrap-around dark-space shield
Shutter for target conditioning

Specifications for MTM-20 High Resolution Thickness Controller:
- General Specifications:  
Microprocessor based, 4-digit display, push-button zero
6MHz crystal with lifetime check
5 times per second update rate
- Thickness Range: 0.0 - 999.9nm (pos/neg)
Resolution: 0.1nm for gold or carbon
Density Range: 0.50 - 30.00g/cm³
Tooling Factor Range: 0.25 - 8.0
Vacuum Feedthrough: CS-108; Diameter 10mm up to a plate/flange thickness of 9mm.
Crystal Holder: Stainless Steel ø19 x 20mm. M4 threaded hole for mounting, 1/2" size crystal
- Dimensions (W x D x H): 210 x 160 x 77mm (8.27" x 6.3" x 3.03")

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